The following basic settings are common for all package types.
The package type must be specified when the repository is created, and once set, cannot be changed.
The repository key is a mandatory, unique identifier for the repository. It cannot begin with a number or contain spaces or special characters.
Defines the environment in which this repository will reside. Environments aggregate project resources (repositories, Pipeline sources, etc.) to simplify their management. For more information, see Environments.
The URL for the remote repository. Currently, only HTTP and HTTPS URLs are supported.
The user name for accessing the URL of the remote repository. Leave this field blank to access the repository anonymously.
The password or access token used to access the repository.
The certificate used for authentication. Click Test to verify the certificate is valid.
Defines the layout used by the remote repository cache for storing and identifying modules. For more information, see Remote Repository Configuration.
Remote Layout Mapping
Defines the layout used by the remote repository for storing and identifying modules. This layout can differ than the layout defined under Repository Layout for the remote repository cache. For more information, see Remote Repository Configuration.
A free text field that describes the content and purpose of the repository. This description can be viewed by all users with access to the repository.
A free text field to add additional notes about the repository. These notes are visible only to the administrator.
Include and Exclude Patterns
The Include Patterns and Exclude Patterns fields provide a way to filter out specific repositories when resolving the location of different artifacts.
In each field, you can specify a list of Ant-like patterns to filter in and filter out artifact queries. Filtering works by subtracting the excluded patterns (default is none) from the included patterns (default is all).
Consider that the Include Patterns and Exclude Patterns for a repository are as follows:
In this example, the repository is searched for
If set, this repository will be considered offline and no attempts will be made to fetch artifacts from it.
Enable Indexing in Xray
Enables indexing on the repository for security and compliance analysis. Available with JFrog Xray.
Repositories may have additional basic settings depending on the package type, as described in the section that follows.
Basic Settings for Maven, Gradle, Ivy, and SBT Repositories
Checking the Checksum effectively verifies the integrity of a deployed resource. The Checksum Policy determines how the system behaves when a client checksum for a remote resource is missing or conflicts with the locally calculated checksum.
There are four options:
Max Unique Snapshots
Specifies the maximum number of unique snapshots of the same artifact that should be stored. Once this number is reached and a new snapshot is uploaded, the oldest stored snapshot is removed automatically.
A value of 0 (default) indicates that there is no limit on the number of unique snapshots.
Eagerly Fetch Jars
When set, if a POM is requested, Artifactory attempts to fetch the corresponding jar in the background. This will accelerate first access time to the jar when it is subsequently requested.
Suppress POM Consistency Checks
By default, the system keeps your repositories healthy by refusing POMs with incorrect coordinates (path). If the
You can disable this behavior by setting the Suppress POM Consistency checkbox.
Eagerly Fetch Sources
When set, if a binaries jar is requested, Artifactory attempts to fetch the corresponding source jar in the background. This will accelerate the initial access time to the source jar when it is subsequently requested.
If set, Artifactory enables you to deploy or cache release artifacts into this repository.
If set, Artifactory enables you to deploy or cache snapshot artifacts into this repository.